WARDE TECHNOLOGY SINGAPORE PTE LTD

was incorporated in July 2012 with a vision to support our regional customers in the Semiconductor and TFT and Solar industries.

 
 
 
 

Our Products Range

We have a wide range of manufacturing and analytical equipment to manufacture a wide range of products and repair capabilities for Semiconductor, TFT and Solar industries.



CMP

Chemical Mechanical Planarization (CMP) a polishing process, which utilizes a chemical slurry formulation and mechanical polishing process to remove unwanted conductive or read more

dielectric materials on the silicon wafer, achieving a near-perfect flat and smooth surface upon which layers of integrated circuitry are built.


THIN FILM

Thin Film Deposition is the technology of applying a very thin film of material – between a few nanometers to about 100 micrometers, or the thickness of a few atoms – onto a
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“substrate” surface to be coated, or onto a previously deposited coating to form layers.


IMPLANT

Ion implantation is low-temperature process by which ions of one element are accelerated into a solid target, thereby changing the physical, chemical, or electrical properties of the
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target Ion implantation is used in semiconductor device fabrication and in metal finishing, as well as in materials science research.


ETCH

Etching is used in microfabrication to chemically remove layers from the surface of a wafer during manufacturing. Etching is a critically important process module, and every read more

wafer undergoes many etching steps before it is complete.